* 🐛 Fix shadows on a masked group in the WASM renderer A masked group renders in two passes: its content, then the mask shape composited with DstIn so everything outside the mask silhouette is erased. Both happen inside one save_layer, and the group's drop shadow was composited into that same layer before the mask pass — so the mask erased it. A drop shadow lives mostly outside the silhouette, so it disappeared entirely. Inner shadows never drew at all: render_fill_inner_shadows needs fill geometry to paint into, and a group has none. Both now ride on an image filter set on the masked-group layer, which Skia evaluates after the mask is composited, so the shadow comes from the real masked pixels rather than the group's own, empty geometry. The effects compose in the order the SVG renderer uses for a group: drop shadows, then the source, then inner shadows, with the layer blur over all of it. That layer is opened on a canvas carrying no transform, so the filter is built in device units. Shadow::scale_to_device does that rather than scale_content, because radius_to_sigma is affine: scaling the radius applies its constant term once at device scale, while a filter built in document space has the term scaled by the canvas matrix. The two would blur differently by 0.5 · (scale - 1) sigma, visible as a masked group's own shadow being narrower than the same shadow on its parent. The masked-group layer blur had the same flaw. Three paths are suppressed for masked groups so nothing is drawn twice: the silhouette composite, the nested_shadows inheritance that would reach text descendants, and the fill inner-shadow pass. Every save and restore around that layer is keyed on the shape alone. Enter and exit run on different walker passes, and a pan or zoom in between changes fast mode, so deriving them from render state could leave the canvas clip stack unbalanced. Refs #11697 AI-assisted-by: claude-opus-5 * 🐛 Fix a container's drop shadow over a masked group in WASM A container builds its drop shadow by drawing each descendant as a black silhouette and blurring the result. The walk descends only through children that can be flattened, and a masked group never can, so it stopped there and asked the group to draw its own geometry. A group has none, so nothing was drawn and the shadow layer stayed blank: no shadow at all for a group, board or frame holding a masked group. This is what the file attached to the issue reproduces. render_drop_black_shadow now draws the masked silhouette for such a group — content children flat black, DstIn the mask, and only then the offset, blur and spread. Masking after the blur would trim the shadow along the wrong edge. The walk recurses, so it narrows the clip the way the main walker does: content a clipping container hides must not widen the shadow. The clip rule now lives in one place, shared with the walker, and a test pins the two against each other. The shadow layer is sized to the silhouette plus the shadow's reach rather than falling back to the clip, so a wide blur is not cut at the tile edge. Spread keeps the renderer's existing behaviour: the silhouette goes through the same get_drop_shadow_filter every other shadow uses, so a masked group gains no ordering of its own. Closes #11697 AI-assisted-by: claude-opus-5
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Penpot is the open-source design platform for teams that build digital products at scale.
Penpot’s key strength lies in giving you full ownership of your design infrastructure. Built on open source and designed for self-hosting, it puts teams in complete control of their design environment supporting strict compliance and governance requirements. Whether used in the browser or deployed on your own servers, Penpot works with open standards like SVG, CSS, HTML, and JSON.
Real-time collaboration strengthens this foundation, helping teams scale and bring design closer to the product through top-tier capabilities. Additionally, developers feel at home using Penpot, because design is expressed as code, enabling a direct translation and shipping products faster.
Best-in-class native Design Tokens provide a single source of truth between design and development. They ensure consistency, improve collaboration, and make it easier to manage complex design systems.
The MCP server takes it further by enabling multi-directional workflows between design and code. A powerful open API and plugin system makes the workspace programmable, enabling automation, AI-driven workflows, and integrations with the tools and systems you already use.
With CSS Grid and Flex Layout, teams can design responsive interfaces that behave like real code from the start.
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Table of contents
Why Penpot
Penpot connects design, code, and AI workflows through a code-based approach, making designs readable by developers and AI via the MCP server. This approach helps teams ship what’s actually designed and manage design systems at scale with powerful design tokens. As a self-hosted, open-source and real-time collaboration platform, Penpot offers full flexibility, security, and ownership without vendor lock-in. Learn more about why Penpot is the platform for your team.
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Penpot plugins let you expand the platform's capabilities, give you the flexibility to integrate it with other apps, and design custom solutions.
Designed for developers
Penpot was built to serve both designers and developers and create a fluid design-code process. You have the choice to enjoy real-time collaboration or play "solo".
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